Lin Named Winner of 2020 Roy W. Tess Award in Coatings
For more than 20 years, Qinghuang Lin has reportedly made impactful contributions to the field of advanced photoresist coatings for modern electronics.
The officers and Award Committee of the American Chemical Society (ACS) Division of Polymeric Materials: Science and Engineering (PMSE) recently announced that the winner of the Roy W. Tess Award in Coatings for 2020 is Qinghuang Lin, Ph.D. For more than 20 years, Lin has reportedly made impactful contributions to the field of advanced photoresist coatings for modern electronics. His seminal contributions are related to polymer coatings, a class of photosensitive polymeric electronic materials called photoresists that are used to “print” modern integrated circuits or microchips.
Lin has spent most of his professional career at IBM, most recently as a senior manager and a research staff member at the IBM Thomas J. Watson Research Center in Yorktown Heights, N.Y. He received his B.E. and M.S. degrees from Tsinghua University in Beijing, China, and his doctorate degree from the University of Michigan at Ann Arbor. He was a post-doctoral fellow at the University of Texas at Austin prior to joining IBM. Lin is a fellow of the ACS, the PMSE division, the ACS Division of Polymer Chemistry (POLY), and the International Society for Optical and Photonics Engineering.